September 30, 2013

Novel HIC polishing platform with enhanced productivity


Modern downstream processes require high-productivity chromatography media (resins) allowing for shorter process time and increased window of operation, for an overall improved process economy.  A challenge when developing porous agarose chromatography media is sufficient rigidity to enable fast process flow rates and the use of high column beds, both contributing to an enhanced productivity.  

The challenge is even more pronounced for media with small particle size designed for polishing applications. To improve productivity compared with current Sepharose™ High Performance hydrophobic interaction chromatography (HIC) polishing media, two novel high-throughput HIC polishing media, Capto™ Phenyl ImpRes and Capto Butyl ImpRes, have been developed.  The media characteristics are presented in this poster.

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